While astonishing femtosecond (1x10^-15 sec) lasers are already available OTS
These guys will even sell you one.
300eV is of course what you need for that "Extreme UV" that people have been touting as the future of narrow line width chip making.
Current systems need a 20Kw laser to generate c10W of "EUV" light to expose a 300mm dia wafer.
I'm guessing but it can also be used for diagnostics on one of those laser fusion systems as well.
Biting the hand that feeds IT
